Semiconductor Laboratory (SCL) — ISRO/MeitY

Relationships

• Depends onSK Materials / SK Specialty— SCL Mohali depends on SK Materials for NF3
• Depends onUPW system (ultra-pure water)— SCL Mohali partially localises UPW
• Depends onNF3 (nitrogen trifluoride)— SCL Mohali depends on imported NF3
• Depends onCMP slurry— SCL Mohali depends on imported CMP slurry
• Depends onFujifilm Corporation — Electronic Materials— SCL Mohali depends on Fujifilm for photoresist and CMP
• Depends onTekscend Photomask (former Toppan Photomasks)— SCL Mohali depends on Tekscend for photomasks
• Depends onSilane (SiH4)— SCL Mohali depends on imported silane for deposition
• Depends onElectronic-grade HF— SCL Mohali depends on imported electronic-grade HF
• Depends on200mm silicon wafer— SCL Mohali depends on imported 200mm silicon wafers
• produces200mm silicon wafer— SCL Mohali produces 200mm wafers in India (180nm CMOS + MEMS)
• Depends onPhotomask for semiconductor lithography— SCL Mohali depends on imported photomasks
• Depends onNikon Corporation — Precision Equipment— SCL Mohali depends on Nikon for ArF/i-line lithography
• Depends onAir Products — Electronic Gases— SCL Mohali depends on Air Products for silane
• Depends onArF photoresist— SCL Mohali depends on imported photoresist
• Depends onCanon Inc. — Semiconductor Equipment— SCL Mohali depends on Canon for i-line lithography
• Depends onCMP pad— SCL Mohali depends on imported CMP pads (DuPont)
• Depends onCadence India— SCL Mohali uses Cadence EDA tools
• Depends onEntegris Inc.— SCL Mohali depends on Entegris for CMP slurry
• Depends onEDA tool suite— SCL Mohali depends on imported EDA tools
• Depends onSynopsys India— SCL Mohali uses Synopsys EDA tools